ICMAB Workshop on
Epitaxial Growth: fundamentals and techniques
Welcome
Advanced thin film deposition techniques allow obtaining epitaxial films, as well as different types of heterostructures with controlled microstructure and a very reduced number of defects. They are thus essential for understanding and tailoring the properties of materials, to obtain materials with new functionalities and to develop devices with new/improved performances. The workshop “Epitaxial growth: fundamentals and techniques” is organized into a series of tutorial talks that will cover the fundamental aspects of epitaxy and the main epitaxial growth techniques.
Speakers
Fundamental aspects of Epitaxial Growth: film nucleation, layer growth, strain release and microstructure
Epitaxial nanocomposites, design and unprecedented functionalities
Pulsed laser deposition
Sputtering deposition
Chemical routes for epitaxial thin film deposition: strengths and weaknesses
Molecular beam epitaxy in materials science
Atomic Layer Deposition, Current State and Future Prospects
Programme
-
09:15WelcomeProf. D. Amabilino ICMAB Director
-
09:20
Fundamental aspects of Epitaxial Growth: film nucleation, layer growth, strain release and microstructure
José Santiso (ICN2) -
10:10
Epitaxial nanocomposites, design and unprecedented functionalities
Judith Driscoll (University of Cambridge) -
11:00Coffee break
-
11:30
Pulsed laser deposition
Florencio Sánchez (ICMAB) -
12:20
Sputtering deposition
Jacobo Santamaría (Universidad Complutense de Madrid) -
13:10Lunch(not included)
-
14:30
Chemical routes for epitaxial thin film deposition: strengths and weaknesses
Francisco Rivadulla (Universidad de Santiago de Compostela) -
15:20
Molecular beam epitaxy in materials science
Maria Isabel Alonso (ICMAB) -
16:10
Atomic Layer Deposition, Current State and Future Prospects
Mariona Coll (ICMAB) -
17:00
End of session
Venue
Institut de Ciència de Materials de Barcelona
Campus
de la UAB
08193
Bellaterra
Barcelona,
Spain
Phone
+34 935 801 853
Email